Investigation of on-chip high temperature annealing of PMOS dosimeters
Kelleher, A.; Lane, W.; Adams, L.
- 期刊名称IEEE Transactions on Nuclear Science
- 作者Kelleher, A.; Lane, W.; Adams, L.
- 卷第43卷
- 期第3期
- 印刷ISSN0018-9499
- 文件大小567.32KB
- 发表时间1996-6
- DOI10.1109/23.510746
- 页码997-1001