Experimental investigations of anisotropic etching of Si in tetramethyl ammonium hydroxide
- 期刊名称Canadian Journal of Physics
- 作者Naseh, S.; Landsberger, L. M.; Kahrizi, M.; Paranjape, M.
- 卷第74卷
- 印刷ISSN0008-4204
- 电子ISSN1208-6045
- 文件大小451.96KB
- 发表时间1996-12
- DOI10.1139/p96-837
- 页码79-84
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