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Influences of deposition temperature on thermal stability and moisture resistance of chemical vapor deposited fluorinated silicon oxide by using indirect fluorinating precursor

Influences of deposition temperature on thermal stability and moisture resistance of chemical vapor deposited fluorinated silicon oxide by using indirect fluorinating precursor

K. M. Chang; S. W. Wang; C. J. Wu; T. H. Yeh; C. H. Li; J. Y. Yang

作者K. M. Chang; S. W. Wang; C. J. Wu; T. H. Yeh; C. H. Li; J. Y. Yang
文件大小318.82KB
发表时间1996
DOI10.1063/1.117423

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