Comparison of damage created by a chemical downstream etcher and plasma-immersion system in metal–oxide–semiconductor capacitors
- 作者T. Brożek
- 文件大小475.57KB
- 发表时间1996
- DOI10.1116/1.588434
Collision-limited lifetimes of atom trapsBjorkholm, J. E. · Physical Review A · 1988
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