Reducing Proximity Effects in Optical Lithography
- 期刊名称Japanese Journal of Applied Physics
- 作者Mack, Chris A.
- 卷第35卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小1006.14KB
- 发表时间1996-12-30
- DOI10.1143/JJAP.35.6379
- 页码6379-6385
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