Reduction of Selectivity Loss Probability on Dielectric Surface during Chemical Vapor Deposition of Tungsten Using Fluorinated Oxide and Removing Silanol Units on Dielectric Surface
- 作者K. M. Chang; S. W. Wang; C. H. Li; J. Y. Tsai; T. H. Yeh
- 文件大小2645.64KB
- 发表时间1996
- DOI10.1143/JJAP.35.6555
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Non-collinear interaction model of the second harmonic generation of a copper vapor laserT. Omatsu; K. Kuroda; T. Shimura; M. Chihara; M. Itoh; I. Ogura · 1990
4.7-W, 255-nm source based on second-harmonic generation of a copper-vapor laser in cesium lithium borateTrickett, Rodney I.; Withford, Michael J.; Brown, Daniel J. W. · ol/23/3/ol-23-3-189.pdf · 1998
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