发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

Comprehensive Study of Plasma Pretreatment Process for Thin Gate Oxide (<10nm) Fabricated by Electron Cyclotron Resonance Plasma Oxidation

Comprehensive Study of Plasma Pretreatment Process for Thin Gate Oxide (<10nm) Fabricated by Electron Cyclotron Resonance Plasma Oxidation

K. Chang; C. Li; F. Fahn; T. Yeh; S. Wang

作者K. Chang; C. Li; F. Fahn; T. Yeh; S. Wang
文件大小979.65KB
发表时间1996
DOI10.1143/JJAP.35.6549

← 返回【学霸图书馆】主页