Influence of Hcl and H2 on the Heteroepitaxial Growth of 3C-SiC Films on Si(100) Via Low-Temperature Chemical Vapor Deposition
- 期刊名称MRS Proceedings
- 作者Edgar, J. H.; Gao, Y.
- 卷第441卷
- 电子ISSN1946-4274
- 文件大小300.53KB
- 发表时间1996-1
- DOI10.1557/proc-441-699
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