Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies.

Novembre, Anthony E.; Tarascon, Regine G.; Berger, Steven D.; Biddick, Chris J.; Blakey, Myrtle I.; Bolan, Kevin J.; Fetter, Linus A.; Harriott, Lloyd R.; Huggins, Harold A.; Knurek, Chester S.; Liddle, J. Alexander; Mixon, David A.; Peabody, Milton L.

期刊名称Journal of Photopolymer Science and Technology
作者Novembre, Anthony E.; Tarascon, Regine G.; Berger, Steven D.; Biddick, Chris J.; Blakey, Myrtle I.; Bolan, Kevin J.; Fetter, Linus A.; Harriott, Lloyd R.; Huggins, Harold A.; Knurek, Chester S.; Liddle, J. Alexander; Mixon, David A.; Peabody, Milton L.
卷第9卷
期第4期
印刷ISSN0914-9244
电子ISSN1349-6336
文件大小556.29KB
发表时间1996
DOI10.2494/photopolymer.9.663
页码663-675

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Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies.