发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

Interfacial characteristics of N[sub 2]O and NO nitrided SiO[sub 2] grown on SiC by rapid thermal processing

Interfacial characteristics of N[sub 2]O and NO nitrided SiO[sub 2] grown on SiC by rapid thermal processing

Li, Hui-feng; Dimitrijev, Sima; Harrison, H. Barry; Sweatman, Denis

期刊名称Applied Physics Letters
作者Li, Hui-feng; Dimitrijev, Sima; Harrison, H. Barry; Sweatman, Denis
卷第70卷
期第15期
印刷ISSN0003-6951
文件大小330.46KB
发表时间1997
DOI10.1063/1.118773

← 返回【学霸图书馆】主页