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Very High Frequency Plasma Enhanced Chemical Vapor Deposition of
<b>
<i>T</i>
<i>i</i>
<i>S</i>
<i>i</i>
<sub/><i>x</i>
</sub>
/
<i>T</i>
<i>i</i>
<i>N</i>
<sub/>
1-
<i>x</i>
</sub><i>S</i>
<i>i</i>
<sub/><i>x</i>
</sub></b>
Barrier Films

Very High Frequency Plasma Enhanced Chemical Vapor Deposition of T i S i _x / T i N _{1-
x}S i _x Barrier Films

Mizuno, Shigeru; Tagami, Manabu; Hasegawa, Shinya; Numasawa, Youichirou

期刊名称Japanese Journal of Applied Physics
作者Mizuno, Shigeru; Tagami, Manabu; Hasegawa, Shinya; Numasawa, Youichirou
卷第36卷
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小185.19KB
发表时间1997-9-15
DOI10.1143/JJAP.36.5651
页码5651-5657

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