Mechanisms for implantation induced interdiffusion at In0.53Ga0.47As/In0.52Al0.48As heterointerfaces

• 作者Tadamasa Kimura; Masahiro Saito; Satoshi Tachi; Riichiro Saito; Michio Murata; Takeshi Kamiya
• 卷第44卷
• 印刷ISSN0921-5107
• 文件大小462.39KB
• 发表时间1997
• DOI10.1016/s0921-5107(96)01796-5
• 页码28-32