Reactive ion etching of 6H-SiC in an ECR plasma of CF4-O2 mixtures using both Ni and Al masks

• 作者Alexander L. Syrkin; Jean Marie Bluet; Jean Camassel; Roger Bonnot
• 卷第46卷
• 印刷ISSN0921-5107
• 文件大小519.87KB
• 发表时间1997
• DOI10.1016/s0921-5107(96)02009-0
• 页码374-378