New Liquid Precursors for Chemical Vapor Deposition
- 期刊名称MRS Proceedings
- 作者Gordon, Roy G.; Chen, Feng; Diceglie, Nicholas J.; Kenigsberg, Amos; Liu, Xinye; Teff, Daniel J.; Thornton, John
- 卷第495卷
- 电子ISSN1946-4274
- 文件大小983.96KB
- 发表时间1997-1
- DOI10.1557/proc-495-63
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