SPIE Proceedings [SPIE Electronic Imaging '97 - San Jose, CA (Saturday 8 February 1997)] Document Recognition IV - Color, complex document segmentation and compression
- 作者Fung, Hei Tao; Parker, Kevin J.; Vincent, Luc M.; Hull, Jonathan J.
- 卷第3027卷
- 印刷ISSN0277-786X
- 文件大小843.14KB
- 发表时间1997
- DOI10.1117/12.270071
- 页码180-191
SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>1995 mask industry quality assessment</title>Bishop, Chris; Strott, Al; Shelden, Gilbert V.; Wiley, James N. · 1995
SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>Low-cost photomask inspection system</title>Gharpure, Damayanti C.; David, Sunil K.; Shelden, Gilbert V.; Wiley, James N. · 1995
SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>24"x 20" precision photomasks manufacture</title>Guel, Graciela R.; Boothman, Martin; Rector, Daniel R.; Wilson, Susan M.; Shelden, Gilbert V.; Wiley, James N. · 1995
SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>Hierarchical proximity correction using CAPROX</title>Hofmann, Ulrich; Kalus, Christian K.; Rosenbusch, Anja; Endo, Hiroyuki; Kimura, Yasuki; Endo, Akihiro; Shelden, Gilbert V.; Wiley, James N. · 1995
SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>Large-area high-quality photomasks</title>Sandstrom, Torbjoern; Odselius, Leif; Shelden, Gilbert V.; Wiley, James N. · 1995
SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>Resist charging in electron-beam lithography</title>Liu, Weidong; Pease, Roger Fabian W.; Shelden, Gilbert V.; Wiley, James N. · 1995
SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>Comprehensive simulation study of the photomask defects printability</title>Karklin, Linard; Shelden, Gilbert V.; Wiley, James N. · 1995
SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - <title>Proximity correction for e-beam lithography</title>Marrian, Christie R.; Chang, Steven; Peckerar, Martin C.; Shelden, Gilbert V.; Wiley, James N. · 1995