Structure, electrical and chemical properties of zirconium nitride films deposited by dc reactive magnetron sputtering
- 作者D. Wu; Z. Zhang; D. Fu; W. Fan; H. Guo
- 卷第64卷
- 期第6期
- 印刷ISSN0947-8396
- 电子ISSN1432-0630
- 文件大小94.23KB
- 发表时间1997-06
- DOI10.1007/s003390050522
- 页码593-595