Poly(phenylhydrosilane): Base-developable polysilane resist
- 作者Rikako Kani; Yoshihiko Nakano; Hiroshi Yoshida; Satoshi Mikoshiba; Shuzi Hayase
- 卷第35卷
- 期第12期
- 印刷ISSN0887-624X
- 电子ISSN1099-0518
- 文件大小279.33KB
- 发表时间1997
- DOI10.1002/(sici)1099-0518(19970915)35:12<2355::aid-pola4>3.0.co;2-u
- 页码2355-2364
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