Boron Diffusion in TaSi2 Thin Films
- 作者R. Marmelstein; M. Sinder; J. Pelleg
- 卷第168卷
- 期第1期
- 印刷ISSN1862-6319
- 文件大小164.61KB
- 发表时间1998
- DOI10.1002/(sici)1521-396x(199807)168:1<223::aid-pssa223>3.0.co;2-4
- 页码223-229
同作者推荐
Low frequency noise characterization of 0.18μm Si CMOS transistorsT. Boutchacha; G. Ghibaudo; G. Guégan; T. Skotnicki · 1997
Electrical noise and RTS fluctuations in advanced CMOS devicesG. Ghibaudo; T. Boutchacha · 2002
Low frequency noise characterization and modelling in ultrathin oxide MOSFETsT. Contaret; K. Romanjek; T. Boutchacha; G. Ghibaudo; F. Bœuf · 2006
DC and low frequency noise characterization of FinFET devicesK. Bennamane; T. Boutchacha; G. Ghibaudo; M. Mouis; N. Collaert · 2009
Low frequency noise characterization of 0.25 μm Si CMOS transistorsT. Boutchacha; G. Ghibaudo; G. Guégan; M. Haond · 1997
Improved low frequency noise model for MOSFET operated in non-linear regionT. Boutchacha; G. Ghibaudo · 2011