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[IEEE Twenty Third IEEE/CPMT International Electronics Manufacturing Technology Symposium. 1998 IEMT Symposium - Austin, TX, USA (19-21 Oct. 1998)] Twenty Third IEEE/CPMT International Electronics Manufacturing Technology Symposium (Cat. No.98CH36205) - A comparison of chilled DI water/ozone and CO/sub 2/-based supercritical fluids as replacements for photoresist-stripping solvents

[IEEE Twenty Third IEEE/CPMT International Electronics Manufacturing Technology Symposium. 1998 IEMT Symposium - Austin, TX, USA (19-21 Oct. 1998)] Twenty Third IEEE/CPMT International Electronics Manufacturing Technology Symposium (Cat. No.98CH36205) - A comparison of chilled DI water/ozone and CO/sub 2/-based supercritical fluids as replacements for photoresist-stripping solvents

Rubin, J.B.; Davenhall, L.B.; Barton, J.; Taylor, C.M.V.; Tiefert, K.
  • 作者Rubin, J.B.; Davenhall, L.B.; Barton, J.; Taylor, C.M.V.; Tiefert, K.
  • 文件大小943.08KB
  • 发表时间1998
  • DOI10.1109/IEMT.1998.731087
  • 页码308-314
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