Multiscale modeling of chemical vapor deposition
- 期刊名称Journal of Applied Physics
- 作者Rodgers, Seth T.; Jensen, Klavs F.
- 卷第83卷
- 期第1期
- 印刷ISSN0021-8979
- 文件大小375.52KB
- 发表时间1998
- DOI10.1063/1.366666
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