The effect of radio frequency plasma processing reactor circuitry on plasma characteristics
- 期刊名称Journal of Applied Physics
- 作者Rauf, Shahid; Kushner, Mark J.
- 卷第83卷
- 期第10期
- 印刷ISSN0021-8979
- 文件大小447.75KB
- 发表时间1998
- DOI10.1063/1.367326
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