Ultrashallow p+/n Junction Formation by 0.5-1 keV Ion Implantation
- 期刊名称Japanese Journal of Applied Physics
- 作者Park, Jihwan; Lee, Jeong-Youb; Lee, Kilho; Hwang, Hyunsang
- 卷第37卷
- 印刷ISSN0021-4922
- 文件大小181.57KB
- 发表时间1998-11-15
- DOI10.1143/JJAP.37.L1376
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