Step distribution in the Si(111) surface and its effect on microstructure of MBE-grown single- and multi-layered films
- 作者Kouichi Nishikawa; Masahiko Yamamoto; Toshiki Kingetsu
- 印刷ISSN0169-4332
- 文件大小360.43KB
- 发表时间1998
- DOI10.1016/s0169-4332(98)00024-5
- 页码54-59
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