Ultra-Fast NiSi2 Formation in p+-Si by High Current Densities
- 期刊名称MRS Proceedings
- 作者Huang, J.S.; Tu, K.N.
- 卷第527卷
- 电子ISSN1946-4274
- 文件大小1471.00KB
- 发表时间1998-1
- DOI10.1557/proc-527-423
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