Characterization of the silicon nitride–thermal oxide interface in oxide–nitride–oxide structures by ELS, XPS, ellipsometry, and numerical simulation

• 作者V.A. Gritsenko; S.N. Svitasheva; I.P. Petrenko; Yu.N. Novikov; Yu.N. Morokov; Hei Wong; R.W.M. Kwok; R.W.M. Chan
• 卷第38卷
• 期第5期
• 印刷ISSN0026-2714
• 文件大小329.75KB
• 发表时间1998
• DOI10.1016/s0026-2714(98)00019-5
• 页码745-751