MOCVD of Strontium Tantalate Thin Films Using Novel Bimetallic Alkoxide Precursors

• 作者Michael J. Crosbie; Peter J. Wright; Hywel O. Davies; Anthony C. Jones; Timothy J. Leedham; Paul O'Brien; Gary W. Critchlow
• 卷第5卷
• 期第1期
• 印刷ISSN0948-1907
• 电子ISSN1521-3862
• 文件大小260.27KB
• 发表时间1999
• DOI10.1002/(sici)1521-3862(199901)5:1<9::aid-cvde9>3.0.co;2-b
• 页码9-12