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Silane Activation by Ti(NMe
<sub/>2</sub>
)
<sub/>4</sub>
and NH
<sub/>3</sub>
during Chemical Vapor Deposition of Ti−Si−N Films

Silane Activation by Ti(NMe ₂ ) ₄ and NH ₃ during Chemical Vapor Deposition of Ti−Si−N Films

Amato-Wierda, Carmela C.; Norton, Edward T.; Wierda, Derk A.

期刊名称Chemistry of Materials
作者Amato-Wierda, Carmela C.; Norton, Edward T.; Wierda, Derk A.
卷第11卷
期第10期
印刷ISSN0897-4756
电子ISSN1520-5002
文件大小209.31KB
发表时间1999-10
DOI10.1021/cm990174j
页码2775-2779

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