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Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor

Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor

M. A. Sobolewski; J. K. Olthoff; Y. Wang

作者M. A. Sobolewski; J. K. Olthoff; Y. Wang
文件大小419.30KB
发表时间1999
DOI10.1063/1.370298

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