Plasma doping for shallow junctions
- 作者M. J. Goeckner; S. B. Felch; Z. Fang; D. Lenoble; J. Galvier; A. Grouillet; G. C. Yeap; D. Bang; M. Lin
- 文件大小501.25KB
- 发表时间1999
- DOI10.1116/1.590906
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