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Investigation of nitric oxide and Ar annealed SiO[sub 2]/SiC interfaces by x-ray photoelectron spectroscopy

Li, Hui-feng; Dimitrijev, Sima; Sweatman, Denis; Harrison, H. Barry; Tanner, Philip; Feil, Bill

期刊名称Journal of Applied Physics
作者Li, Hui-feng; Dimitrijev, Sima; Sweatman, Denis; Harrison, H. Barry; Tanner, Philip; Feil, Bill
卷第86卷
期第8期
印刷ISSN0021-8979
文件大小352.48KB
发表时间1999
DOI10.1063/1.371363