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Ge-related faceting and segregation during the growth of metastable (GaAs)[sub 1−x](Ge[sub 2])[sub x] alloy layers by metal–organic vapor-phase epitaxy

Ge-related faceting and segregation during the growth of metastable (GaAs)[sub 1−x](Ge[sub 2])[sub x] alloy layers by metal–organic vapor-phase epitaxy

Norman, A. G.; Olson, J. M.; Geisz, J. F.; Moutinho, H. R.; Mason, A.; Al-Jassim, M. M.; Vernon, S. M.
  • 期刊名称Applied Physics Letters
  • 作者Norman, A. G.; Olson, J. M.; Geisz, J. F.; Moutinho, H. R.; Mason, A.; Al-Jassim, M. M.; Vernon, S. M.
  • 卷第74卷
  • 期第10期
  • 印刷ISSN0003-6951
  • 文件大小531.86KB
  • 发表时间1999
  • DOI10.1063/1.123557
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