Mechanical and Chemical Properties of CBxNy and CSixNy Thin Films Grown by N*-Plasma Assisted Pulsed Laser Deposition
- 期刊名称MRS Proceedings
- 作者Thärigen, T.; Riede, V.; Lippold, G.; Hartmann, E.; Hesse, R.; Streubel, P.; Lorenz, D.; Grau, P.; Lorenz, M.
- 卷第593卷
- 电子ISSN1946-4274
- 文件大小404.67KB
- 发表时间1999-1
- DOI10.1557/proc-593-541
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