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Low Temperature Chemical Vapor Deposition of Titanium Nitride Thin Films With Hydrazine and Tetrakis-(dimethylamide)Titanium

Low Temperature Chemical Vapor Deposition of Titanium Nitride Thin Films With Hydrazine and Tetrakis-(dimethylamide)Titanium

Amato-Wierda, Carmela; Norton, Edward T.; Wierda, Derk A.
  • 期刊名称MRS Proceedings
  • 作者Amato-Wierda, Carmela; Norton, Edward T.; Wierda, Derk A.
  • 卷第606卷
  • 电子ISSN1946-4274
  • 文件大小342.46KB
  • 发表时间1999-1
  • DOI10.1557/proc-606-91
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