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Aspects of Gas Phase Chemistry During Chemical Vapor Deposition of Ti-Si-N Thin Films With Ti(NMe2)4 (TDMAT), NH3, and SiH4

Aspects of Gas Phase Chemistry During Chemical Vapor Deposition of Ti-Si-N Thin Films With Ti(NMe2)4 (TDMAT), NH3, and SiH4

Amato-Wierda, Carmela; Norton, Edward T.; Wierda, Derk A.

期刊名称MRS Proceedings
作者Amato-Wierda, Carmela; Norton, Edward T.; Wierda, Derk A.
卷第606卷
电子ISSN1946-4274
文件大小1038.47KB
发表时间1999-1
DOI10.1557/proc-606-97

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