Plasma and fluorocarbon-gas free Si dry etching process using a Cat-CVD system
- 作者Akira Izumi; Hidekazu Sato; Shingi Hashioka; Manabu Kudo; Hideki Matsumura
- 印刷ISSN0167-9317
- 文件大小536.36KB
- 发表时间2000
- DOI10.1016/s0167-9317(99)00504-3
- 页码495-503
海量图书期刊资源，随时随地畅享阅读乐趣