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Crystallization of amorphous silicon–germanium films deposited by low pressure chemical vapor deposition

Crystallization of amorphous silicon–germanium films deposited by low pressure chemical vapor deposition

D Guillet; M Sarret; L Haji; R Rogel; O Bonnaud
  • 作者D Guillet; M Sarret; L Haji; R Rogel; O Bonnaud
  • 印刷ISSN0022-3093
  • 文件大小160.57KB
  • 发表时间2000
  • DOI10.1016/s0022-3093(99)00784-x
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