Novel cleaning solutions for polysilicon film post chemical mechanical polishing

Tung Ming Pan, ; Tan Fu Lei, ; Chao Chyi Chen, ; Tien Sheng Chao, ; Ming Chi Liaw, ; Wen Lu Yang, ; Ming Shih Tsai, ; Lu, C.P.; Chang, W.H.

期刊名称IEEE Electron Device Letters
作者Tung Ming Pan, ; Tan Fu Lei, ; Chao Chyi Chen, ; Tien Sheng Chao, ; Ming Chi Liaw, ; Wen Lu Yang, ; Ming Shih Tsai, ; Lu, C.P.; Chang, W.H.
卷第21卷
期第7期
印刷ISSN0741-3106
电子ISSN1558-0563
文件大小57.14KB
发表时间2000-07
DOI10.1109/55.847373
页码338-340

发现好书期刊，享受阅读乐趣