[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Medium energy ion scattering analysis of damage in silicon caused by ultra-low energy boron implantation at different substrate temperatures
- 作者Shenjun Zhang, ; Berg, J.A.V.D.; Armour, D.G.; Whelan, S.; Goldberg, R.G.; Bailey, P.; Noakes, T.C.Q.
- 文件大小449.28KB
- 发表时间2000
- DOI10.1109/.2000.924105
- 页码119-122
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