[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - On the mechanism of plasma enhanced dielectric deposition charging damage
- 作者Cheung, K.P.
- 文件大小297.25KB
- 发表时间2000
- DOI10.1109/ppid.2000.870658
- 页码161-163
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