Effect of hydrogen dilution on the structure of SiOF films prepared by remote plasma enhanced chemical vapor deposition from SiF[sub 4]-based plasmas
J. C. Alonso; E. Pichardo; V. Pankov; A. Ortiz
- 作者J. C. Alonso; E. Pichardo; V. Pankov; A. Ortiz
- 文件大小616.11KB
- 发表时间2000
- DOI10.1116/1.1308593