Etching mechanism of (Ba, Sr)TiO[sub 3] films in high density Cl[sub 2]/BCl[sub 3]/Ar plasma
- 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- 作者Kim, Seung-Bum; Lee, Yong-Hyuk; Kim, Tae-Hyung; Yeom, Geun-Young; Kim, Chang-Il
- 卷第18卷
- 期第4期
- 印刷ISSN0734-2101
- 文件大小815.64KB
- 发表时间2000
- DOI10.1116/1.582358
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