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[IEEE 2000 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (13-15 June 2000)] 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) - Impacts of strained SiO/sub 2/ on TDDB lifetime projection

[IEEE 2000 Symposium on VLSI Technology. Digest of Technical Papers - Honolulu, HI, USA (13-15 June 2000)] 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) - Impacts of strained SiO/sub 2/ on TDDB lifetime projection

Harada, Y.; Eriguchi, K.; Niwa, M.; Watanabe, T.; Ohdomari, I.

作者Harada, Y.; Eriguchi, K.; Niwa, M.; Watanabe, T.; Ohdomari, I.
文件大小277.67KB
发表时间2000
DOI10.1109/vlsit.2000.852831
页码216-217

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