First Principles Study of Atomic-Scale Al2O3 Films as Insulators for Magnetic Tunnel Junctions
- 期刊名称Japanese Journal of Applied Physics
- 作者Watari, Noriko; Saito, Mineo; Tsuge, Hisanao; Sugino, Osamu; Ohnishi, Shuhei
- 卷第39卷
- 印刷ISSN0021-4922
- 文件大小116.05KB
- 发表时间2000-5-15
- DOI10.1143/JJAP.39.L479
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