发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

Observation of Transient Enhanced Diffusion in B+-Implanted Si by Buried Boron Isotopes

Observation of Transient Enhanced Diffusion in B+-Implanted Si by Buried Boron Isotopes

R. Chang; H. Chiang; H. Liu; L. Ho; P. Chiang; J. Tsai; J. Lin

作者R. Chang; H. Chiang; H. Liu; L. Ho; P. Chiang; J. Tsai; J. Lin
文件大小111.09KB
发表时间2000
DOI10.1143/JJAP.39.6136

← 返回【学霸图书馆】主页