[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Two implant measurement of pressure compensation factors
- 作者Halling, M.
- 文件大小279.41KB
- 发表时间2000
- DOI10.1109/iit.2000.924220
- 页码585-587
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