Control of Amorphous Silicon Crystallization Using Germanium Deposited by Low Pressure Chemical Vapor Deposition
- 期刊名称MRS Proceedings
- 作者Toita, Masato; Kalavade, Pranav; Saraswat, Krishna C.
- 卷第609卷
- 电子ISSN1946-4274
- 文件大小535.07KB
- 发表时间2000-1
- DOI10.1557/proc-609-a9.5
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