Low Temperature Nitridatio of SiO2 Films using a Catalytic-CVD System
- 期刊名称MRS Proceedings
- 作者Izumi, Akira; Sato, Hidekazu; Matsumura, Hideki
- 卷第611卷
- 电子ISSN1946-4274
- 文件大小450.15KB
- 发表时间2000-1
- DOI10.1557/proc-611-c4.5.1
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