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[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Improvement of p/sup +/ contact resistance through optimal boron distribution TiSi/sub 2//P/sup +/ interface for 0.18 μm DRAM technology and beyond

[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Improvement of p/sup +/ contact resistance through optimal boron distribution TiSi/sub 2//P/sup +/ interface for 0.18 μm DRAM technology and beyond

Jeong Su Han, ; Il Gweon Kim,

作者Jeong Su Han, ; Il Gweon Kim,
文件大小362.83KB
发表时间2000
DOI10.1109/.2000.924096
页码83-86

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