SPIE Proceedings [SPIE Optics and Optoelectronic Inspection and Control: Techniques, Applications, and Instruments - Beijing, China (Wednesday 8 November 2000)] Instruments for Optics and Optoelectronic Inspection and Control - Theoretical and experimental study of Cs 852-nm FADOF
- 作者Bi, Yong; Zhang, Yundong; Jia, Xiaoling; Wang, Qi L.; Ma, Zuguang; Wei, Guang Hui; Liu, Sheng
- 卷第4223卷
- 印刷ISSN0277-786X
- 文件大小124.11KB
- 发表时间2000
- DOI10.1117/12.401772
- 页码122-126
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