Modeling of Silicon Dioxide Chemical Vapor Deposition from Tetraethoxysilane and Ozone
- 期刊名称Journal of The Electrochemical Society
- 作者Romet, S.; Couturier, M. F.; Whidden, T. K.
- 卷第148卷
- 期第2期
- 印刷ISSN0013-4651
- 文件大小222.65KB
- 发表时间2001
- DOI10.1149/1.1342186
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